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首页> 外文期刊>Vacuum: Technology Applications & Ion Physics: The International Journal & Abstracting Service for Vacuum Science & Technology >Phosphorus removal from upgraded metallurgical-grade silicon by vacuum directional solidification
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Phosphorus removal from upgraded metallurgical-grade silicon by vacuum directional solidification

机译:通过真空定向凝固从升级的冶金级硅去除磷

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AbstractThe removal of phosphorus impurities is among the most important problems in the purification of upgraded metallurgical-grade silicon (UMG-Si) used in the preparation of solar-grade silicon (SOG-Si). Vacuum refining is considered relatively effective for removing phosphorus from molten silicon. Based on the saturated vapor pressure of phosphorus calculated, the removal of phosphorus from UMG-Si at 1823K was performed via an industrial-scale vacuum directional solidification (VDS) furnace in this paper. Amathematical model for phosphorus removal during VDS was proposed to predict the distribution of phosphorus in silicon ingots. An industrial-scale experiment was carried out to confirm the mathematical model. The results demonstrated that phosphorus could be removed effectively main by vacuum evaporation during the VDS process, and thephosphorus concentration was about 4.63–13.41?ppm.The relationship between the phosphorus concentration and the resistivity of the silicon is discussed by experimental and calculated findings. The experimental results show that the resistivity decreases from 0.354?Ω?cm to 0.259?Ω?cm with increased phosphorus concentration.Highlights?Vacuum refining is considered rela
机译:<![CDATA [ 抽象 磷杂质的去除是升级冶金级硅净化中最重要的问题(UMG- SI)用于制备太阳能级硅(SOG-SI)。真空精炼被认为是相对有效地从熔融硅中去除磷。基于计算磷的饱和蒸气压,本文通过工业规模真空定向凝固(VDS)炉在1823K处从UMG-Si中除去磷。提出了VDS期间磷去除的磷去除的散热模型,以预测硅锭磷的分布。进行了工业规模的实验以确认数学模型。结果表明,在VDS过程中,通过真空蒸发可以通过真空蒸发去除磷,并且磷浓度为约4.63-13.41〜ppm。通过实验和计算的调查结果讨论了磷浓度与硅的电阻率之间的关系。实验结果表明,具有增加的磷浓度的电阻率从0.354ΩΩ·cm到0.259Ω·cm减小。 亮点 ?< / ce:标签> 真空炼制被认为是Rela

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