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Topological approach to quantum Hall effects and its important applications: higher Landau levels, graphene and its bilayer

机译:拓扑霍尔效应的拓扑方法及其重要应用:较高的地兰水平,石墨烯及其双层

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In this paper the topological approach to quantum Hall effects is carefully described. Commensurability conditions together with proposed generators of a system braid group are employed to establish the fractional quantum Hall effect hierarchies of conventional semiconductors, monolayer and bilayer graphene structures. Obtained filling factors are compared with experimental data and a very good agreement is achieved. Preliminary constructions of ground-state wave functions in the lowest Landau level are put forward. Furthermore, this work explains why pyramids of fillings from higher bands are not counterparts of the well-known composite-fermion hierarchy - it provides with the cause for an intriguing robustness of nu = 7/3 , 8/3 and 5/2 states (also in graphene). The argumentation why paired states can be developed in two-subband systems (wide quantum wells) only when the Fermi energy lies in the first Landau level is specified. Finally, the paper also clarifies how an additional surface in bilayer systems contributes to an observation of the fractional quantum Hall effect near half-filling, nu = 1/2 .
机译:本文仔细描述了量子霍尔效应的拓扑方法。使用具有系统编织组的所提出的发电机的可致致性条件来建立传统半导体,单层和双层石墨烯结构的分数量子霍尔效应层次结构。获得的灌装因子与实验数据进行比较,实现了非常好的协议。提出了最低Landau水平的地面波函数的初步结构。此外,这项工作解释了为什么较高频段填充金字塔不是众所周知的复合码头层次结构的对应物 - 它提供了对Nu = 7/3,8 / 3和5/2态的有趣鲁棒性的原因(也是石墨烯)。该论证只有在指定了第一个Landau水平的Fermi能量所在时,才能在双带系统(宽量子阱)中开发配对状态。最后,本文还阐明了双层系统中的额外表面如何有助于观察分数量子霍尔效应附近的半填充,Nu = 1/2。

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