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首页> 外文期刊>The European physical journal, B. Condensed matter physics >Kinetic Monte Carlo simulation of small vacancy clusters electromigration on clean and defective Cu(100) surface
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Kinetic Monte Carlo simulation of small vacancy clusters electromigration on clean and defective Cu(100) surface

机译:Kinetic Monte Carlo模拟小型空置簇电迁移干净,缺陷Cu(100)表面

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Electromigration of small vacancy clusters on clean and defective Cu(100) surface is investigated on the atomic scale by performing self-learning kinetic Monte Carlo simulations. Drift velocity dependencies of vacancy clusters on their size, the substrate temperature, the direction and the absolute value of current density are obtained. The drift velocity dependence on the size of vacancy cluster has an oscillatory behavior. The nature of these oscillations is connected with the difference in diffusion mechanisms of fast and slow vacancy clusters. The presence of point defects leads to the monotonic decrease of the drift velocity of vacancy clusters. The drift velocity drops down if the diameter of the vacancy cluster is larger than the average distance between the point defects.
机译:通过进行自学动力学蒙特卡罗模拟对清洁和有缺陷的Cu(100)表面进行清洁和有缺陷Cu(100)表面的小空位簇的电迁移。 获得空置簇的尺寸,基板温度,方向和电流密度的绝对值的漂移速度依赖性。 漂移速度依赖于空位簇的尺寸具有振荡行为。 这些振荡的性质与快速和慢速空位簇的扩散机制的差异相连。 点缺陷的存在导致空位簇的漂移速度的单调减少。 如果空位簇的直径大于点缺陷之间的平均距离,则漂移速度下降。

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