Studying the Formation of Antireflection Coatings on Multijunction Solar Cells

摘要

The formation of antireflection coating on multijunction solar cells based on A(3)B(5) semiconductor heterostructures has been studied at the stage of structure surface processing by methods of plasmachemical, wet chemical, and ion-beam etching. A technology of creating antireflection coatings based on TiOx/SiO2 layers is developed. The obtained coatings are characterized by improved adhesion to the surface of heterostructure and reduced reflection coefficient of multijunction solar cells.