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Multifrequency nanoscale impedance microscopy (m-NIM): A novel approach towards detection of selective and subtle modifications on the surface of polycrystalline boron-doped diamond electrodes

机译:多频性纳米级阻抗显微镜(M-NIM):一种探测多晶硼掺杂金刚石电极表面的选择性和微妙修饰的新方法

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摘要

In this paper, we describe the modification of Nanoscale Impedance Microscopy (NIM), namely, a combination of contact-mode atomic force microscopy with local impedance measurements. The postulated approach is based on the application of multifrequency voltage perturbation instead of standard frequency-by-frequency analysis, which among others offers more time-efficient and accurate determination of the resultant impedance spectra with high spatial resolution. Based on the impedance spectra analysis with an appropriate electric equivalent circuit, it was possible to map surface resistance and contact capacitance.
机译:在本文中,我们描述了纳米级阻抗显微镜(NIM)的修饰,即接触模式原子力显微镜与局部阻抗测量的组合。 假设方法基于多频电压扰动而不是标准频率频率分析的应用,其中包括具有高空间分辨率的所得阻抗光谱的更多时间效率和准确地确定。 基于具有适当电力等效电路的阻抗光谱分析,可以映射表面电阻和接触电容。

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