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首页> 外文期刊>Progress in Solid State Chemistry >Mixed ternary transition metal nitrides: A comprehensive review of synthesis, electronic structure, and properties of engineering relevance
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Mixed ternary transition metal nitrides: A comprehensive review of synthesis, electronic structure, and properties of engineering relevance

机译:混合三元过渡金属氮化物:综合审查合成,电子结构和工程相关性的性质

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摘要

Ternary transition metal nitrides (TTMNs) have acquired substantial attention due to the ability to offer for tuning properties. Furthermore efforts to develop new TTMNs have resulted in the development of new syntheses approaches. In this review, recent progress made regarding investigations on electronic structure, stoichiometry, crystal structures, synthesis and applications are reviewed. Intermediate bonding in these solids exist in the structure types revealed so far. Bonding in these systems are an intriguing mix of ionic (oxide-like) and covalent (carbide-like). This enhances the possibilities of finding unique structures (i.e. anti-fluorite analogous [1]). A good case in point is the Delafosite types and eta-nitrides structures found commonly in TTMNs which are typically associated with ABO(x) type oxides and carbides. Due to the rich structural chemistry associated with TTMNs, their study is considered a growing area in solid state and applied chemistry. Advancement made in the synthesis of powder and thin film materials of TTMNs are discussed. The powder methods involve the following methods: solid state, high-pressure-high temperature, solvothermal method, ammonothermal method, sol-gel method, Pechini method, temperature-programmed reduction, thermal degradation of metal complex, solid-state metal oxide-organic reaction, solid state ion exchange reaction, and electrodeposition replacement method. On the other hand, the TTMN thin film fabrication is based on two types of methods; physical vapor deposition (PVD) and chemical vapor deposition (CVD) method. The PVD involve deposition using different ways using laser or plasma based approaches (eg. pulsed laser deposition (PLD)) and magnetron sputtering. Chemical vapor deposition methods involve electrodeposition reaction method. Among all synthesis methods, the sol-gel process following the ammonolysis is considered comparatively better for large scale production owing to the simple apparatus setup. Different synthesis methods are deployable based on the application at hand. Applications can be range from electrocatalysts in ORR reaction [2,3], electrocatalysts as sensor [4], supercapacitors [2,3,5], solar cell [6], magnetic, superconducting [7], hard coating materials [8] e.g. protective, functional, conductive, wear-resistance and decorative coating, NH3 synthesis [9], and hydrogenation process in hydrocarbon reactions [10].
机译:由于提供调整特性的能力,三元过渡金属氮化物(TTMNS)已经获得了大量关注。此外,开发新TTMN的努力导致了新的合成方法的发展。在本文中,综述了关于电子结构,化学计量,晶体结构,合成和应用的研究的最新进展。到目前为止,这些固体中的中间键合存在于迄今为止的结构类型中。在这些系统中键合是离子(氧化物样)和共价(碳化物样)的有趣混合物。这提高了找到独特结构的可能性(即抗萤石类似物[1])。在点的良好情况是透水类型和ETA-氮化物结构通常在TTMN中发现,其通常与ABO(x)型氧化物和碳化物相关。由于与TTMN相关的富有的结构化学,他们的研究被认为是固态和应用化学的生长面积。讨论了在TTMNS的合成粉末和薄膜材料中进行的进步。粉末方法涉及以下方法:固态,高压 - 高温,溶剂热法,氨水法,溶胶 - 凝胶法,Pechini方法,减少温度编程,金属复合物的热降解,固态金属氧化物 - 有机反应,固态离子交换反应和电沉积替代方法。另一方面,TTMN薄膜制造基于两种类型的方法;物理气相沉积(PVD)和化学气相沉积(CVD)方法。 PVD使用基于激光或等离子体的方法使用不同方式沉积(例如,脉冲激光沉积(PLD))和磁控溅射。化学气相沉积方法涉及电沉积反应方法。在所有合成方法中,由于简单的装置设置,在大规模生产中考虑了氨解后的溶胶 - 凝胶过程。不同的合成方法是基于手头的应用部署的。应用可以是来自ORR反应的电催化剂的范围[2,3],电催化剂作为传感器[4],超级电容器[2,3,5],太阳能电池[6],磁性,超导[7],硬涂料[8]例如保护性,功能性,导电,耐磨性和装饰涂层,NH3合成[9],以及烃反应中的氢化过程[10]。

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