Silicon-containing block copolymers for lithographic applications

摘要

This comprehensive review, summarizes recent advances in the fabrication of well-ordered block copolymer (BCP) thin films by different methods, focusing on the development of silicon-containing BCPs as candidates for lithographic applications. With the advantage of Si-containing blocks, these BCPs offer much smaller feature sizes due to large segregation strength and high etch contrast for the fabrication of well-defined nanopatterns with high resolution. Considering that poly(dimethylsiloxane) (PDMS)-containing BCPs are widely studied systems among Si-containing BCPs, the possibility of using PDMS-containing BCPs for lithographic applications is demonstrated through previous and ongoing key research.