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机译:用浸纳米纳米剥离光刻用金属纳米结构的大面积图案化光学应用
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
Department of PhysicsThe Chinese University of Hong KongShatin Hong Kong SAR China;
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
Department of PhysicsThe Chinese University of Hong KongShatin Hong Kong SAR China;
Department of Chemistry and International Institute for NanotechnologyNorthwestern University2145 Sheridan Road Evanston IL 60208 USA;
Laboratory for Advanced Interfacial Materials and DevicesInstitute of Textiles and ClothingHong Kong SAR China;
nanofabrication; polymer brush; scanning probe lithography; solar cells; transparent conductive electrodes;
机译:用浸纳米纳米剥离光刻用金属纳米结构的大面积图案化光学应用
机译:通过平行浸笔纳米位移光刻技术高分辨率,大面积,串行制造3D聚合物刷结构
机译:表面上的金属,半导体和金属氧化物纳米结构的浸涂笔纳米光刻图案
机译:平行浸笔式纳米光刻技术制备亚波长金属纳米结构
机译:使用纳米球面光刻和RIE刻蚀制造二维纳米结构阵列及其在光学器件中的应用。
机译:直接接触印刷光刻技术在软基板上构图的阵列金属纳米结构的波导等离子体共振
机译:通过浸笔式纳米位移光刻(DNL)编程聚合物刷的纳米结构
机译:模式奇点和崩溃:应用于半导体激光器和超短光脉冲的临界聚焦。提前计划和摘要纲要