Optical and Electrical Properties of Thin NiO Films Deposited by Reactive Magnetron Sputtering and Spray Pyrolysis

摘要

Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(lambda), absorption coefficient alpha(lambda), extinction coefficient k(lambda), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.