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首页> 外文期刊>Nanoscale and microscale thermophysical engineering >Comparison between Grating Imaging and Transient Grating Techniques on Measuring Carrier Diffusion in Semiconductor
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Comparison between Grating Imaging and Transient Grating Techniques on Measuring Carrier Diffusion in Semiconductor

机译:光栅成像与瞬态光栅技术对半导体测量载波扩散的比较

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摘要

Optical grating technique, where optical gratings are generated via light inference, has been widely used to measure charge carrier and phonon transport in semiconductors. In this paper, compared are three types of transient optical grating techniques: transient grating diffraction, transient grating heterodyne, and grating imaging, by utilizing them to measure carrier diffusion coefficient in a GaAs/AlAs superlattice. Theoretical models are constructed for each technique to extract the carrier diffusion coefficient, and the results from all three techniques are consistent. Our main findings are: (1) the transient transmission change Delta T/T-0 obtained from transient grating heterodyne and grating imaging techniques are identical, even these two techniques originate from different detection principles; and (2) by adopting detection of transmission change (heterodyne amplification) instead of pure diffraction, the grating imaging technique (transient grating heterodyne) has overwhelming advantage in signal intensity than the transient grating diffraction, with a signal intensity ratio of 315:1 (157:1).
机译:通过光推理产生光栅的光学光栅技术已被广泛用于测量半导体中的电荷载体和声子传输。在本文中,比较是三种类型的瞬态光学光栅技术:瞬态光栅衍射,瞬态光栅外差和光栅成像,利用它们测量GaAs / Alas超晶格中的载流子扩散系数。为每种技术构建理论模型以提取载流子扩散系数,并且所有三种技术的结果是一致的。我们的主要研究结果是:(1)从瞬态光栅外差和光栅成像技术获得的瞬态传输变化δT/ T-0是相同的,即使这两种技术也来自不同的检测原理; (2)通过采用透射变化(外差扩增)而不是纯衍射的检测,光栅成像技术(瞬态光栅外差)在信号强度方面具有比瞬态光栅衍射的压倒性优势,信号强度比为315:1( 157:1)。

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