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首页> 外文期刊>Nano: brief reports and reviews >Comparison of Fast Response and Recovery Pd Nanoparticles and Ni Thin Film Hydrogen Gas Sensors Based on Metal-Oxide-Semiconductor Structure
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Comparison of Fast Response and Recovery Pd Nanoparticles and Ni Thin Film Hydrogen Gas Sensors Based on Metal-Oxide-Semiconductor Structure

机译:基于金属氧化物半导体结构的快速响应和回收PD纳米粒子和Ni薄膜氢气传感器的比较

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In this study, two hydrogen sensors with Pd/SiO2/Si and Ni/SiO2/Si structures have been fabricated. Palladium nanoparticles are synthesized and then deposited on the oxide surface using spin coating. Capacitance-voltage curves for the Pd/SiO2/Si sensor at room temperature and for the Ni/SiO2/Si sensor at 140 degrees C in pure nitrogen and 1% H-2-N-2 mixture are described. The time required for reaching 90% of the steady-state signal magnitude (t(90%)) for Pd/SiO2/Si capacitor was 1.4 s and for Ni/SiO2/Si capacitor was 90 s. The time interval for recovery from 90% to 10% of steady-state signal magnitude (t(10%)) for Pd/SiO2/Si capacitor was 14 s and for Ni/SiO2/Si capacitor was 40 min. For the Pd/SiO2/Si capacitor, the response is 88% and for Ni/SiO2/Si capacitor the response is 29%. Comparison of Pd nanoparticles capacitive-and resistance-based sensors shows that the metal-oxide-semiconductor capacitive is faster and more sensitive than the resistance-based hydrogen gas sensors.
机译:在本研究中,已经制造了具有PD / SiO2 / Si和Ni / SiO 2 / Si结构的两个氢传感器。 合成钯纳米颗粒,然后使用旋涂沉积在氧化物表面上。 描述了在室温下的PD / SiO2 / Si传感器的电容 - 电压曲线和在纯氮气中的140℃下的Ni / SiO2 / Si传感器的电容电压曲线和1%H-2-N-2混合物的140℃。 达到PD / SiO2 / Si电容器的90%稳态信号幅度(T(90%))所需的时间为1.4 s,对于Ni / SiO2 / Si电容为90秒。 从PD / SiO2 / Si电容器的稳态信号幅度(T(10%))的90%到10%的时间间隔为14秒,对于Ni / SiO2 / Si电容为40分钟。 对于PD / SIO2 / SI电容器,响应为88%,对于NI / SIO2 / SI电容,响应是29%。 PD纳米颗粒的比较电容和基于电阻的传感器表明,金属氧化物半导体电容器比基于电阻的氢气传感器更快且更敏感。

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