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首页> 外文期刊>Molecular crystals and liquid crystals >Properties of Cu2ZnSnS4 Films with Respect to Sulfurization Time Investigated using Cu-Zn-Sn Films Deposited by Co-sputtering
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Properties of Cu2ZnSnS4 Films with Respect to Sulfurization Time Investigated using Cu-Zn-Sn Films Deposited by Co-sputtering

机译:Cu-Zn-Sn薄膜通过共溅射沉积的Cu-Zn-Sn膜研究Cu2ZnSNS4膜的性质

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摘要

Cu2ZnSnS4 (CZTS) thin films have been used as an absorber layer for solar cells because they have a large absorption coefficient and a direct band gap of suitable energy. We investigated the properties of CZTS thin films with respect to the sulfurization time by using Cu-Zn-Sn (CZT) metal precursor films. The CZT metal precursor films were deposited onto soda-lime glass by co-sputtering with single targets of copper (Cu), zinc (Zn), and tin (Sn). The sulfurization of the CZT films was performed in evacuated and sealed quartz ampoules using sulfur powder. The sealed samples were annealed at 550 degrees C for times ranging from 1 to 60min.The crystallization of the CZTS films as a function of annealing time was investigated using X-ray diffraction (XRD). The XRD peaks of CZTS appeared in the XRD patterns of the samples that were annealed for at least 3min. Furthermore, the intensity of the CZTS peaks increased with annealing time. The increase in peak intensity and decrease in the full width at half maximum (FWHM) indicate that crystallization increases with annealing time. The morphology and the atomic compositional ratios of the CZTS films were also analyzed by using field emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray spectroscopy (EDX), respectively. The band gap energy of the CZTS films was determined using a UV-Vis-NIR spectrophotometer. The estimated optical energy band gap of the CZTS films that were annealed for more than 10min ranged from 1.4 to 1.5eV, which is close to the previously reported value of 1.45eV.
机译:Cu2ZNSN4(CZTS)薄膜已被用作太阳能电池的吸收层,因为它们具有很大的吸收系数和合适能量的直接带隙。我们通过使用Cu-Zn-Sn(CZT)金属前体膜来研究CZTS薄膜相对于硫化时间的性质。通过用单一的铜(Cu),锌(Zn)和锡(Sn)通过溅射将CZT金属前体膜沉积在钠钙玻璃上。使用硫粉末在抽空和密封的石英安瓿中进行CZT膜的硫化。将密封的样品在550℃下退火,次数为1至60min。使用X射线衍射(XRD)研究CZTS膜作为退火时间的函数的结晶。 CZT的XRD峰出现在样品的XRD图案中,其退火至少3分钟。此外,CZTS峰的强度随退火时间而增加。半最大(FWHM)的峰值强度和降低的峰强度的增加表明结晶随着退火时间增加。通过使用现场发射扫描电子显微镜(Fe-SEM)和能量分散X射线光谱(EDX),还分析了CZTS膜的形态和原子成分比。使用UV-Vis-Nir分光光度计测定CZT膜的带间隙能量。被冷却膜的估计光学能带隙,其退火超过10分钟的范围为1.4至1.5EV,其接近先前报告的1.45EV值。

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