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Evaluation of the pitch deviation of a linear scale based on a self-calibration method with a Fizeau interferometer

机译:基于自校准方法的线性尺度与自校准方法用外径干涉仪评估

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摘要

A self-calibration method, in which the wavefronts of zeroth and first-order diffracted beams from a scale grating measured by a Fizeau interferometer are employed, is applied for the evaluation of the pitch deviation of a reflective-type linear scale with a grating pitch of 2.048 mu m used in a commercial interferential scanning-type optical linear encoder. One of the advantages of the self-calibration method is that the pitch deviation of a scale grating can be evaluated while measuring the out-of-flatness of the scale grating under inspection and theZ-directional out-of-flatness (surface profile) of the reference optical flat in the Fizeau interferometer. Meanwhile, in a practical case, the self-calibration method is valid under the condition where the out-of-flatness of the scale grating is on the same order or less than that of the reference optical flat in the Fizeau interferometer. In this paper, theoretical analysis and numerical calculations are thus carried out to investigate the influence of the out-of-flatness of the scale grating on measurement of the pitch deviation and the out-of-flatness of the reference optical flat. Some experiments with a linear scale from a commercial interferential scanning-type linear encoder are also carried out to verify the feasibility of the self-calibration method for the evaluation of the pitch deviation of the scale having an out-of-flatness of approximately 600 nm over the analyzed area.
机译:采用自校准方法,其中采用来自由Fizeau干涉仪测量的刻度光栅的Zeroth和一阶衍射光束的波前施加用于评估反射型线性刻度与光栅间距的距离偏差2.048亩M用于商用干涉扫描型光学线性编码器。自校准方法的一个优点是可以评估刻度光栅的间距偏差,同时测量在检查下的刻度光栅的平面度和Z的方向外平直(表面轮廓)的平坦度Fizeau干涉仪中的参考光学平面。同时,在实际情况下,自校准方法在刻度光栅的平静度与不同的订单相同的顺序或小于外汇干涉仪中的参考光学平坦的条件下有效。在本文中,因此进行了理论分析和数值计算,以研究规模光栅的平面度对音调偏差的测量和参考光学平坦的平面度的影响。还执行了来自商业干涉扫描型线性编码器的线性刻度的一些实验,以验证自校准方法的可行性,以评估具有大约600nm的平坦度的刻度的间距偏差在分析的区域。

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