UV-curable micro-imprinting method for the fabrication of microstructure arrays

摘要

This study proposed a UV-curable micro-imprinting method for the fabrication of microstructure arrays using a self-made UV-sensitive material. Based on the custom-made micro-imprinting device with a UV light source, a series of experiments were conducted for the analysis of the compressive stress and radiation's influences on the formation of microstructure array. The fabricated microstructures were measured with 3D laser confocal microscope, the result indicates that the proposed micro-imprinting technology with the self-made UV-sensitive material is of high replication precision with relatively low-cost, which could have wide potential application prospect for the fabrication of microstructures in optical-MEMS and microfluidics. The proposed method also has the ability for the rapid massive industrial fabrication of microstructure arrays.