...
首页> 外文期刊>Crystal Research and Technology: Journal of Experimental and Industrial Crystallography >Effect of Cu/In ratio on properties of CuInSe_2 thin films prepared by selenization of Cu-In layers
【24h】

Effect of Cu/In ratio on properties of CuInSe_2 thin films prepared by selenization of Cu-In layers

机译:Cu / In比对硒化Cu-In层制备的CuInSe_2薄膜性能的影响

获取原文
获取原文并翻译 | 示例
           

摘要

In this paper, the chalcopyrite CuInSe2 thin films were fabricated from a selenization of electrodeposited Cu-In layers. In this study, the electrodeposition time of the In layer was set, but that for the Cu layer was not. The thin films were selenized in a sealed glass tube with pure Se powder by three different Cu layer samples at various electrodeposition times at 500 ℃ for 2 hours. An FE-SEM image of the sample shows that the copper-rich product has irregular agglomerates with a dense surface. The X-ray diffraction patterns show CuInSe_2 peaks for all samples. However, the X-ray diffraction pattern reveals CuSe_2 peaks when the electrodeposition time of the Cu layer increases. On the other hand, the band gap (E_g) of the samples decreases from 1.15 to 1.07 eV when the Cu/In ratio increases.
机译:本文通过电沉积Cu-In层的硒化制备黄铜矿CuInSe2薄膜。在这项研究中,设置了In层的电沉积时间,但没有设置Cu层的电沉积时间。三种不同的铜层样品分别在500℃的不同电沉积时间下,用纯硒粉在密封的玻璃管中将薄膜硒化2小时。样品的FE-SEM图像显示,富铜产品具有不规则的附聚物,表面致密。 X射线衍射图显示所有样品的CuInSe_2峰。然而,当Cu层的电沉积时间增加时,X射线衍射图显示CuSe_2峰。另一方面,当Cu / In比增加时,样品的带隙(E_g)从1.15降低到1.07eV。

著录项

相似文献

  • 外文文献
  • 中文文献
  • 专利
获取原文

客服邮箱:kefu@zhangqiaokeyan.com

京公网安备:11010802029741号 ICP备案号:京ICP备15016152号-6 六维联合信息科技 (北京) 有限公司©版权所有
  • 客服微信

  • 服务号