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首页> 外文期刊>Materials science in semiconductor processing >Physical properties of solution processable n-type Fe and Al co-doped ZnO nanostructured thin films: Role of Al doping levels and annealing
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Physical properties of solution processable n-type Fe and Al co-doped ZnO nanostructured thin films: Role of Al doping levels and annealing

机译:溶液的物理性质加工N型Fe和Al共掺杂ZnO纳米结构薄膜:Al掺杂水平和退火的作用

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The role of annealing temperature and Fe and Al co-doping on structural, optical, electrical and magnetic properties of solution processable ZnO thin films were investigated. ZnO: Fe thin films fixed with 2% of typical ferrous component were obtained to examine the role of 1-10% Al doping. X-ray diffraction analyses clearly indicates that the films to be polycrystalline and preferentially oriented along the c-axis of the hexagonal wurtzite structure. The film thickness, homogeneous distribution and decreasing/increasing of grain size dependence on Al content/annealing temperature (TA) were assessed by scanning electron microscopy. X-ray photoelectron spectroscopy revealed that Al3+ and Fe2+ ions to substitute for Zn2+ without changing the wurtzite structure. A slight decrease in the optical band gap of ZnO at fixed Fe dopant and a considerable increase of the optical band gap with increased Al doping concentrations and TA were observed. The refractive index increases with the fixed Fe dopant level and then decreases by Al doping levels, whereas the extinction coefficient clearly increases depended on both of Fe and Al concentrations. The refractive index and extinction coefficient both decrease with TA. Hall measurements show n-type conductivity and the increase of charge carrier concentration by Al doping levels and TA. Magnetic studies indicate room temperature ferromagnetism in Al and Fe co-doped ZnO thin films, whereas no room temperature ferromagnetism for the Fe-doped ZnO thin films was observed. An enhanced room temperature ferromagnetism in Al and Fe co-doped ZnO thin films was observed to depend on T-A.
机译:研究了退火温度和Fe和Al共掺杂对溶液加工ZnO薄膜的结构,光学,电气和磁性的作用。 ZnO:用2%的典型铁组分固定的Fe薄膜以检测1-10%掺杂的作用。 X射线衍射分析清楚地表明薄膜是多晶的并且优先沿六边形纯矿结构的C轴定向。通过扫描电子显微镜评估薄膜厚度,均匀分布和粒度对Al含量/退火温度(TA)的依赖性的增加。 X射线光电子能谱显示Al3 +和Fe2 +离子替代Zn2 +而不改变紫零结构。在固定Fe掺杂剂处的ZnO光带间隙的轻微减少,观察到具有增加的Al掺杂浓度和TA的光学带隙的相当大增加。折射率随固定的Fe掺杂剂水平增加,然后通过Al掺杂水平降低,而消光系数明显增加依赖于Be和Al浓度两种。折射率和消光系数都随TA减少。霍尔测量显示N型导电性,并通过掺杂水平和TA增加电荷载体浓度。磁性研究表示Al和Fe共掺杂ZnO薄膜中的室温铁磁性,而没有观察到Fe掺杂的ZnO薄膜的室温铁磁性。观察到Al和Fe共掺杂ZnO薄膜中增强的室温铁磁性以取决于T-A。

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