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Determination of the structure and orientation of nanometer-sized precipitates in matrix materials via transmission diffraction signals emitted by bulk samples in the Scanning Electron Microscope

机译:通过扫描电子显微镜中的散装样品发射的透射衍射信号测定基质材料中纳米尺寸沉淀物的结构和取向

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The characterization of precipitates in bulk materials by Electron Backscatter Diffraction becomes challenging when the precipitate size falls below 200 nm. This is due to the drastic decrease of diffracted intensity with decreasing precipitate size and the rapidly growing signal generated by the surrounding matrix. A new technique is presented and allows determination of the structure and orientation of precipitates far below 100 nm directly in bulk samples in the Scanning Electron Microscope, normally requiring thin lamella extraction and Transmission Electron Microscopy analysis. The technique relies on the selective chemical etching of the matrix material of a sample, combined with the large tilt characteristic of the EBSD technique. As a result of the selective etching, precipitates protrude from the surface and emit what turns out to be a transmission diffraction signal instead of a backscatter diffraction signal, even though the sample remains massive. With this technique successful analysis of precipitates down to 30 nm was performed in a bulk Cu/Cr sample produced by Laser Powder Bed Fusion Additive Manufacturing with standard EBSD hardware. A Monte Carlo simulation confirms that the intensity of the transmission signal collected from a nanometer-sized precipitate protruding from the surface is much higher than the intensity of the backscatter signal collected from the same precipitate embedded right underneath the surface of a flat EBSD sample. Transmission signals emitted by bulk samples are a great opportunity to study features whose size are below the resolution limit of EBSD, like nanometer-sized precipitates, while keeping the possibility of exploring large areas and without the need to produce a thin lamella.
机译:当沉淀尺寸低于200nm时,通过电子反向散射衍射散装衍射沉淀物的表征变得挑战。这是由于衍射强度的急剧下降,随着沉淀的沉淀尺寸和周围基质产生的快速生长信号。提出了一种新的技术,并允许在扫描电子显微镜中直接在散装样品中直接测定沉淀物的结构和取向,通常需要薄的薄片提取和透射电子显微镜分析。该技术依赖于样品的基质材料的选择性化学蚀刻,与EBSD技术的大倾斜特性组合。作为选择性蚀刻的结果,沉淀物从表面突出并发射,即使样品保持巨大,也可以发出变速器衍射信号而不是反向散射衍射信号。利用该技术,在通过标准EBSD硬件制造的激光粉末融合添加剂制造生产的散装Cu / Cr样品中,对沉淀物的成功分析。蒙特卡罗模拟确认从从表面突出的纳米尺寸沉淀收集的传输信号的强度远高于从平面EBSD样品的表面上嵌入的相同沉淀物收集的反向散射信号的强度。由批量样本发出的传输信号是学习尺寸低于EBSD的分辨率限制的特征的绝大机会,如纳米尺寸的沉淀,同时保持探索大面积的可能性,而无需生产薄薄片。

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