Unmasking lithography

摘要

Wafer bonding and lithography equipment supplier EVGroup has unveiled its new maskless exposure (MLE) technology, created as a digital alternative to traditional mask-based methods. According to the company, MLE is capable of running at high scalability for high-volume manufacturing, which should enable greater flexibility and short development cycles for new devices. Creating equipment for micro-electro-mechanical systems (MEMS), nanotechnology and semiconductor markets, EVGroup developed this new lithographic printing technique as a way to pre-empt back-end lithography needs that may arise when producing future products. The company said while it was designed for intricate applications including MEMS and biomedicine, it is also suitable for advanced packaging and high-density printed circuit boards (PCB).