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Charge transfer at oxygen/zirconia interface at elevated temperatures

机译:高温下氧气/氧化锆界面上的电荷转移

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The present study reports work function changes in cubic yttria-stabilised zirconia (10 mol-percent Y_2O_3) during oxidation and reduction at elevated temperatures. The data for work function changes, determined in the range 773-1173 K, are discussed in terms of the effect of temperature on the oxidation mechanism and related charge transfer at the oxygen/zirconia interface. It was found that oxidation results in oxygen incorporation in the entire temperature range studied, however only at 773 and 1173 K is the surface free of the surface charge produced by oxygen chemisorption. The WF changes are used for the determination of the oxygen chemisorption isobar corresponding to singly ionised atomic oxygen species. Its maximum appears at 1073 K and corresponds to around 41 percent surface coverage. The isobar is considered in terms of the reactivity mechanism between zirconia and oxygen and related charge transfer.
机译:本研究报告了在高温下氧化和还原过程中立方氧化钇稳定的氧化锆(Y_2O_3为10摩尔%)中的功函数变化。根据温度对氧化机理的影响以及在氧/氧化锆界面上的相关电荷转移,讨论了在773-1173 K范围内确定的功函数变化数据。发现在整个研究的温度范围内氧化导致氧结合,但是仅在773和1173 K下,该表面不含由氧化学吸附产生的表面电荷。 WF变化用于确定与单个离子化的原子氧种类相对应的氧化学吸附等压线。它的最大值出现在1073 K处,对应约41%的表面覆盖率。根据氧化锆和氧气之间的反应机理以及相关的电荷转移来考虑等压线。

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