机译:Zr替代的Ba0.6SR0.4TiO3在不同激光器流量下由脉冲激光沉积(PLD)生长的铁电薄膜
Univ Hyderabad Sch Phys Hyderabad Andhra Pradesh India;
Univ Hyderabad Sch Phys Hyderabad Andhra Pradesh India;
Univ Hyderabad Sch Phys ACRHEM Hyderabad Andhra Pradesh India;
Univ Hyderabad Sch Phys Hyderabad Andhra Pradesh India;
Univ Hyderabad Sch Phys Hyderabad Andhra Pradesh India;
Univ Hyderabad Sch Phys Hyderabad Andhra Pradesh India;
(Ba0.6Sr0.4)(Ti0.8Zr0.2)O-3 (BSZT); pulsed laser deposition; laser fluence; optical properties; microwave dielectric properties;
机译:Zr替代的Ba0.6SR0.4TiO3在不同激光器流量下由脉冲激光沉积(PLD)生长的铁电薄膜
机译:脉冲激光沉积制备纳米结构铁电Ba0.6Sr0.4TiO3薄膜的微波表征
机译:脉冲激光沉积生长Fe掺杂Ba0.6Sr0.4TiO3薄膜的介电和可调特性的改进
机译:铁电薄膜与超导氧化物的脉冲激光沉积(PLD)
机译:脉冲激光沉积在非线性光波导中生长的铁电氧化物薄膜的合成与性能
机译:衬底温度和氧分压对脉冲激光沉积生长纳米晶铜氧化物薄膜性能的影响
机译:通过脉冲激光沉积(PLD)生长的Ba0.5SR0.5Co0.8Fe0.2O3-δ薄膜的参数和微观结构性能的优化