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首页> 外文期刊>IEEE Transactions on Ultrasonics, Ferroelectrics, and Frequency Control >Improvement in dielectric and tunable properties of Fe-doped Ba0.6Sr0.4TiO3 thin films grown by pulsed-laser deposition
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Improvement in dielectric and tunable properties of Fe-doped Ba0.6Sr0.4TiO3 thin films grown by pulsed-laser deposition

机译:脉冲激光沉积生长Fe掺杂Ba0.6Sr0.4TiO3薄膜的介电和可调特性的改进

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Fe-doped Ba0.6Sr0.4TiO3 (BST) thin films were prepared on Pt/Si substrates by the pulsed-laser deposition method. The concentrations of Fe dopants vary from 0.1 mol% to 1.0 mol%. Our results indicate that a certain amount of Fe dopants can decrease the dielectric loss of BST thin films without causing the significant reduction of the tunability. The leakage current of BST thin films also was reduced by the addition of Fe dopants. BST thin films doped with 0.3 mol% Fe ions show a minimum dielectric loss of 0.88% at 106 Hz, which is 1.7% for the undoped BST films. Moreover, the 0.3 mol% Fe-doped BST films reveal a maximum figure of merit (FOM) of 51, indicating the improved comprehensive dielectric and tunable properties.
机译:采用脉冲激光沉积法在Pt / Si衬底上制备了Fe掺杂的Ba0.6Sr0.4TiO3(BST)薄膜。 Fe掺杂剂的浓度在0.1mol%至1.0mol%之间变化。我们的结果表明,一定量的铁掺杂剂可以降低BST薄膜的介电损耗,而不会引起可调谐性的显着降低。 BST薄膜的漏电流也通过添加铁掺杂剂而降低。掺杂有0.3 mol%Fe离子的BST薄膜在106 Hz时的最小介电损耗为0.88%,对于未掺杂的BST薄膜而言,这一损耗为1.7%。此外,掺有0.3 mol%Fe的BST薄膜的最大品质因数(FOM)为51,表明其综合介电和可调性能得到改善。

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