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Electrical and optical properties of vanadium pentoxide nano-thin films with different substrate polishing processes

机译:二氧化二钒纳米薄膜具有不同基板抛光方法的电气和光学性质

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Vanadium pentoxide (V2O5) nano-thin films were deposited on sapphire substrates under two different polishing processes (traditional loose abrasive polishing and a new type of hydrophilic fixed abrasive polishing) by R.F. reactive magnetron sputtering. The crystallinity of the films was studied using X-ray diffraction and surface morphology of the films was studied using profilometer and atomic force microscopy. The results show that the substrate has higher surface quality by using new type polishing, of which the mean roughness (S-a) are 1.2nm, while 3.0nm under traditional polishing. And the film roughness decreases from 2.1nm to 1.3nm with the increase of substrate surface qualities. The two nano-films are all polycrystalline vanadium pentoxide films on (001) preferred orientation. Then the effects of surface quality on electrical and optical properties of the films were studied systematically. As surface quality increasing, phase-transition temperature lowers from 262 degrees C to 253 degrees C while the electrical mutation properties get worse. Both the optical turn-off time and turn-on time diminish with the reduction of the substrate surface quality, which cover from 2.3ms and 33ms under traditional polishing to 1.9ms and 27ms under hydrophilic FA polishing respectively. And the dynamic range of transmittance varies greatly from 3.67 to 4.86 with the improvement of substrate surface quality under a laser beam of 1064nm.
机译:通过R.F,在两种不同的抛光过程(传统的宽松磨料抛光和新型亲水固定磨料抛光)下沉积五氧化二钒(V2O5)纳米薄膜沉积在蓝宝石基材上。反应磁控溅射。使用X射线衍射研究薄膜的结晶度,使用型材计和原子力显微镜研究膜的表面形态。结果表明,通过使用新型抛光,基材具有更高的表面质量,其中平均粗糙度(S-A)为1.2nm,而传统抛光下的3.0nm。随着基板表面质量的增加,薄膜粗糙度从2.1nm降至1.3nm。两个纳米薄膜是(001)优选取向的所有多晶钒五氧化钒膜。然后系统地研究了表面质量对电气和光学性质的影响。随着表面质量的增加,相变温度从262摄氏度降低到253摄氏度,而电突变性质变得更糟。光学关断时间和导通时间都随着衬底表面质量的降低而减少,其在传统抛光下的2.3ms和33ms下覆盖分别在亲水性FA抛光下的1.9ms和27ms。并且动态透射率范围从3.67到4.86变化,在1064nm的激光束下改善基板表面质量。

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