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Microwave-assisted synthesis of imprinted polymer for selective removal of arsenic from drinking water by applying Taguchi statistical method

机译:通过应用Taguchi统计方法将微波辅助合成压印聚合物从饮用水中选择性除去砷。

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In the present study, As3+ imprinted polymer as an active detoxification material has been synthesized through microwave assisted preparation method. By inducing the microwave radiation during the polymerization process decreases the reaction time to about 10 folds than conventional method. The imprinted polymer is one of the best possible techniques for the removal of arsenic, and various other contaminants from drinking water. The SEM and FTIR analyses have been conducted to clarify microstructure, surface morphology and size distribution of the synthesized imprinted polymer. The main parameters affecting the pzc, pH, agitation time, shaking speed, concentration, the temperature of adsorbent and percent of sorption, have been examined and optimized by Taguchi design. Taguchi L9 orthogonal array was employed to optimize the important factors versus % sorption values with nine experimental runs at 3 levels. Moreover, to understand the reaction phenomenon Langmuir and Freundlich isotherms, kinetic models and thermodynamics of adsorption process were calculated. The relative selectivity coefficient of imprinted polymer for As3+/Cd-2, As3+/Zn2+,As3+ /Ni2+ were respectively 45.93, 131.01, 262.63 times greater than for non-imprinted polymer. The limit of detections (LOD) and limit of quantification (LOQ) of the proposed procedure for As ion was found to be 1.0 mu g/L and 3.3 mu g/L for the As3+ ion respectively, with the relative standard deviation (RSD) of 4%. The excellent adsorption performance along with their low cost and convenient synthesis makes this range of adsorbent highly promising for commercial applications in drinking water purification and water treatment.
机译:在本研究中,通过微波辅助制备方法合成了AS3 +压印聚合物作为活性解毒材料。通过在聚合过程中诱导微波辐射,比常规方法降低反应时间至约10倍。印迹聚合物是除砷的最佳技术之一,以及来自饮用水的各种其他污染物的技术之一。已经进行了SEM和FTIR分析以阐明合成的印迹聚合物的微观结构,表面形态和尺寸分布。通过Taguchi设计检查和优化了影响PZC,pH,搅拌时间,振动速度,浓度,吸附剂温度和吸附百分比的主要参数。塔本氏菌L9正交阵列用于优化3个水平的九个实验运行的重要因素与%吸附值。此外,为了了解反应现象朗米尔和Freundlich等温,计算了吸附过程的动力学模型和热力学。为AS3 + / CD-2,As3 + / Zn2 +,As3 + / Ni2 +的印迹聚合物的相对选择性系数分别为非印记聚合物的45.93,131.01,262.63倍。作为离子的所提出的方法的检测极限(LOD)和定量限制(LOQ)分别为AS3 +离子为1.0μg/ L和3.3μg/ l,具有相对标准偏差(RSD) 4%。优异的吸附性能以及它们的低成本和方便的合成使得这一系列吸附剂对饮用水净化和水处理中的商业应用具有高度前途。

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