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首页> 外文期刊>Electronic Device Failure Analysis: A Resource for Technical Information and Industry Developments >ENSURING ADVANCED SEMICONDUCTOR DEVICE RELIABILITY USING FA AND SUBMICRON DEFECT DETECTION
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ENSURING ADVANCED SEMICONDUCTOR DEVICE RELIABILITY USING FA AND SUBMICRON DEFECT DETECTION

机译:使用FA和亚微米缺陷检测确保先进的半导体器件可靠性

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摘要

Recent industry trends are placing increased requirements on the need to fully understand the thermal behavior of today's advanced semiconductor devices to ensure long-term reliability. Due to the critical nature of applications such as 5G, automotive electronics, artificial intelligence (AI), cloud storage, and military electronic systems, they all demand higher performance while simultaneously placing increased requirements on longterm reliability. Device developments that achieve higher power levels and faster switching speeds with increased functionality are driving device features to submicron levels and increasing complexity. The resulting power densities and potential for higher operating temperatures, localized hot spots, and unanticipated time-dependent thermal anomalies are compounding the challenges of ensuring adequate reliability.
机译:最近的行业趋势正在提高对充分了解当今先进半导体器件的热行为的需求,以确保长期可靠性。 由于5G,汽车电子,人工智能(AI),云存储和军用电子系统等应用的危急性质,它们都需要更高的性能,同时对Longterm可靠性提高要求。 实现更高功率水平和更快的开关速度的设备开发,具有增加的功能是将设备特征驱动到亚微米级别并提高复杂性。 由此产生的功率密度和更高的操作温度,局部热点和意外的时间依赖性热异常的电位是复制确保足够可靠性的挑战。

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