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首页> 外文期刊>International Journal of Theoretical and Applied Mechanics >DFT Study of Structural and Electronic Properties of TiN/AlN/TiN Interlayer
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DFT Study of Structural and Electronic Properties of TiN/AlN/TiN Interlayer

机译:锡/ ALN /锡层间结构和电子性质的DFT研究

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摘要

First-principles calculations were carried out by means of the pseudopotential method, employing computational Quantum ESPRESO code within density functional theory, for study the structural and electronic properties of the TiN/AlN/TiN interlayer in the rock-salt (NaCl) structure. We found that the bulk modullus of the interlayer is high. In addition, we found that interlayer is energetically stable, with a formation energy of - 2.0 eV/cell. The density states reveal that interlayer have a metallic behavior, this metallic behavior come from hybridization between 3d-Ti and 2p-N orbitals, which are responsible of the high hardness of interlayer.
机译:通过伪能量方法进行第一原理计算,采用密度函数理论内的计算量子ESPRSOO码,用于研究岩盐(NaCl)结构中锡/ AlN / TiN中间层的结构和电子性质。 我们发现中间层的散装模块很高。 此外,我们发现层间能量稳定,具有-2.0eV /细胞的形成能量。 密度状态表明,中间层具有金属行为,这种金属行为来自3D-Ti和2p-n轨道之间的杂交,其负责中间层的高硬度。

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