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首页> 外文期刊>International Journal of Refractory Metals & Hard Materials >Preparation and property characterization of WS2 coatings deposited on micro-nano textured surfaces of cemented carbide at different WS2 target currents
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Preparation and property characterization of WS2 coatings deposited on micro-nano textured surfaces of cemented carbide at different WS2 target currents

机译:不同WS2目标电流下粘附碳化物微纳米纹理表面的WS2涂层的制备及性能特征

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摘要

WS2 coatings were deposited on a micro-nano textured surface of cemented carbide by means of medium frequency magnetron sputtering, multi-arc ion plating and ion-beam-assisted deposition techniques. The effects of different WS2 target currents on the physical properties of the WS2 coating then were investigated. Furthermore, the mechanisms of soft WS2 coatings deposited on an untextured plain surface versus a micro-nano textured surface in the scratch test were evaluated. The results showed that when the WS2 target current was 1 A, the morphology of the periodic coated micro-nano textures was the clearest, the WS2 (002) crystal face of the type-II texture (c-axis perpendicular to substrate) demonstrated the best coating crystallization and the coating/substrate critical load was the largest among the five samples. It was also discovered that the WS2 soft coating formed a lubricating film on the micro-nano textured surface that reduced coating spallation and brittle fracture during the scratch test. It was concluded therefore that the soft WS2 coating on the micro-nano textured surface effectively improved the coating/substrate critical load value.
机译:通过中频磁控溅射,多电弧离子电镀和离子束辅助沉积技术沉积WS2涂层在硬质合金的微纳米纹理表面上。研究了不同WS2靶电流对WS2涂层物理性质的影响。此外,评价沉积在未致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致致纹状的平纹表面上的刮擦试验中的微纳米纹理表面的机制。结果表明,当WS2靶电流为1A时,周期性涂覆的微纳米纹理的形态是最清晰的,II型纹理(垂直于衬底的C轴)的WS2(002)晶体面临最佳涂层结晶和涂层/底物关键载荷是五个样品中最大的载荷。还发现WS2软涂层在微纳米纹理表面上形成润滑膜,在划痕试验期间减少涂层脱落和脆性断裂。因此,它的结论是微纳米纹理表面上的软WS2涂层有效地改善了涂层/基板临界负载值。

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