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首页> 外文期刊>International Journal of Refractory Metals & Hard Materials >1-yTa yN single layer and Ti 1-xAl xN/Cr 1-yTa yN multilayer coatings]]>
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1-yTa yN single layer and Ti 1-xAl xN/Cr 1-yTa yN multilayer coatings]]>

机译:<![CDATA [CR 1-Y TA Y N单层和TI 1-X AL X N / CR 1-Y TA Y N多层涂层]]>

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摘要

AbstractCr1-yTayN single-layer and Ti1-xAlxN/Cr1-yTayN multilayer hard coatings were deposited on cemented carbide substrates using magnetron sputter deposition and cathodic arc evaporation. For the sputtered coatings a bias voltage of ?50V was applied, while arc evaporated coatings were deposited at three different bias voltages of ?40, ?60 and ?80V. The coatings were grown from powder metallurgically produced CrTa targets with a composition of 75at% Cr and 25at% Ta, resulting in a Cr/Ta ratio of 71/29 in the sputtered coatings and 74/26 in the arc evaporated coatings, independent of the applied bias voltage. All coatings are characterized by a single-phase face centered cubic structure. The sputtered single- and multilayer coatings exhibited a hardness of ~22.2 and ~25.2GPa, respectively. For the arc evaporated coatings, a hardness of ~22.7 could be determined for the multilayer, while for the single-layers the hardness increased from ~21.6 to ~24.3GPa with increasing bias voltage. Ball-on-disk tests against alumina at room temperature, 500 and 700°C yielded wear rates comparable to conventional Ti1-xAlxN coatings, but significantly lower friction coefficients. The performed cutting tests also showed promising results, indicating the high application potential of Cr1-xTaxN-based hard coatings.Graphical abstractDisplay OmittedHighlights?Cr1-xTaxN single- and Ti1-xAlxN/Cr1-xTaxN multilayers successfully deposited?Cr1-xTaxN single-layer coatings showed (001) oriented fcc structure.?Lower COF for single- and multilayers than for Ti1-xAlxN at elevated temperatures?50% longer lifetime of Ti1-xAlxN/Cr1-xTaxN in milling compared to Ti1-xAlxN]]>
机译:<![cdata [ 抽象 CR 1-Y TA y n单层和ti 1-x al X N / CR 1-Y TA Y n多层使用磁控溅射沉积和阴极电弧蒸发沉积硬涂层在静碳碳化物基板上。对于溅射涂层,施加Δ50V的偏置电压,而在三个不同的α40,Δ60和α80V的三个不同的偏置电压下沉积电弧蒸发涂层。从粉末冶金制造的CRTA靶涂层的组合物的粉末生长为75at%Cr和25at%Ta的组成,在溅射涂层中的Cr / Ta比和74/26中的弧形蒸发涂料中的74/26,与施加偏置电压。所有涂层的特征在于单相面中心的立方结构。溅射的单层和多层涂层分别表现出〜22.2和〜25.2gPa的硬度。对于电弧蒸发的涂层,可以针对多层测定〜22.7的硬度,而对于单层,硬度从偏压增加增加到21.6至约24.3gPa。在室温下对氧化铝进行氧化铝,500和700°C的磨损率可与常规Ti 1-X AL X N涂层,但摩擦系数明显降低。所执行的切割测试还显示出有前途的结果,指示Cr 1-x ta x 基于N基的硬涂层。 图形摘要 显示省略 亮点 cr 1-X TA X n单个和TI 1 -x al x n / cr 1-x ta < CE:INF LOC =“post”> x n多层成功存放 Cr 1-x ta x n单层涂层显示(001)定向FCC结构。 单个和多层的较低cof,而不是ti 1-x al x n在升高的温度下 ti al x n / cr 1-x ta X n与TI 1-x al x n ]]>

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