105081 Powder metallurgic fabricated plug targets for the synthesis of AlCrSiWN multicomponent coating systems

摘要

Monolithic and alloyed targets, conventionally produced by means of melt metallurgy, have been established as conventional target material designs for physical vapor depositions (PVD). However, integrating refractory metals into the sputtering material, leads to restrictions concerning the solubility and phase formation in the target compound. In this context, plug targets are commonly used to deposit multinary coatings with a desired chemical composition. However, producing plugs by means of melt metallurgy restricts the types and amounts of integrated elements.