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首页> 外文期刊>International Journal of Applied Mathematics & Statistics >Mass Spectrometric Study of Energy Distributions of Sputtered Copper Monomer under Low Energy Ar~+ Ions Bombardments
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Mass Spectrometric Study of Energy Distributions of Sputtered Copper Monomer under Low Energy Ar~+ Ions Bombardments

机译:低能量Ar〜+离子轰击下溅射铜单体能量分布的质谱研究

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Secondary neutral mass spectrometry (SNMS) involving post ionized sputtered neutrals, has been used to determine the energy distribution of neutral Cu_1 particles sputtered from a polycrystalline Cu target by normally incident Ar~+ ions with energies ranging between 100 - 240 eV. A magnetically confined arc discharge at low Ar pressure, located in the source region of the mass spectrometer, has been used for ion bombardment of the target, and simultaneously for electron impact post-ionization of sputtered neutrals ejected normal to the target. The energy distribution of sputtered neutral atoms was found to exhibit a peak at an ejection energy of 4.2 eV, and tail - off above this energy, approximately, as E~(-1.72). This asymptotic behavior is discussed in view of Sigmund-Thompson model of the random collision cascade. The average energy of the sputtered atoms increases from 7 eV to 9 eV within the ion energy range of 100 - 240 eV.
机译:涉及后电离溅射中性的次级中性质谱(SNM)已被用于确定通过通常在100-240eV之间的能量的常规入射的AR〜+离子从多晶Cu靶溅射从多晶Cu靶溅射的中性Cu_1颗粒的能量分布。 位于质谱仪的源区的低AR压力下的磁狭窄的电弧放电已被用于靶的离子轰击,并且同时用于溅射中性的溅射中性的电离电离的电子冲击。 发现溅射中性原子的能量分布在4.2eV的喷射能量下表现出峰值,并且在该能量之上的尾部偏离,大约为E〜(-1.72)。 鉴于随机碰撞级联的Sigmund-Thompson模型讨论了这种渐近行为。 溅射原子的平均能量在100-240eV的离子能量范围内从7eV到9eV增加。

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