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A Differential Subthreshold SRAM Cell for Ultra-Low Voltage Embedded Computing Applications

机译:用于超低电压嵌入式计算应用的差分亚阈值SRAM单元

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With scaling of CMOS technology, data stability of SRAM at ultra-low supply voltage has become a critical issue for embedded wearable computing applications. In this work, we suggest an advanced 8T SRAM cell which can operate properly in subthreshold voltage regime. The cell utilizes a differential swing in the read and write path, and allows an efficient column-interleaving structure. In the read operation, a column-wise assistline scheme of the cell leads to the cell being unaffected by the read disturbance. In addition, the bit-cell keeps the noise-vulnerable data 'low' node voltage close to the ground level during the dummy-read operation, thus producing near-ideal voltage transfer characteristics essential for robust SRAM functionality. In the write access, the boosted wordline facilitates to change the contents of the memory bit. Implementation results with 180 nm CMOS technology exhibit that the proposed cell remains unaffected by the read disturbance, while achieves 59% higher dummy-read stability and 3.7 times better write-ability at a subthreshold supply voltage compared to the conventional 6T SRAM cell. The stability enhancement provided with the proposed bit-cell is confirmed under process, voltage and temperature variations.
机译:通过CMOS技术的缩放,SRAM的数据稳定性在超低电源电压下已成为嵌入式可穿戴计算应用的关键问题。在这项工作中,我们建议一个先进的8T SRAM单元,其可以在亚阈值电压状态下正常运行。该电池利用读写路径中的差分摆动,并允许有效的列交织结构。在读取操作中,电池的列明智辅助方案导致电池不受读干扰的影响。另外,位单元在虚拟读取操作期间将噪声易受损坏的数据“低”节点电压保持接近地电平,从而产生近乎理想的SRAM功能必不可少的电压传输特性。在WRITE访问权限中,升级字线便于更改内存位的内容。实施结果具有180nm CMOS技术的结果表明,与传统的6T SRAM单元相比,所提出的电池仍未受到读取干扰的影响,而较高的虚拟读取稳定性和较高的虚拟读取稳定性和3.7倍的写入能力。在处理,电压和温度变化下确认提供具有所提出的比特单元的稳定性增强。

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