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首页> 外文期刊>Industrial and organizational psychology >Unique Layer-Doping-Induced Regulation of Charge Behavior in Metal-Free Carbon Nitride Photoanodes for Enhanced Performance
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Unique Layer-Doping-Induced Regulation of Charge Behavior in Metal-Free Carbon Nitride Photoanodes for Enhanced Performance

机译:独特的层掺杂诱导的金属碳氮化碳光碳中的充电行为调节,用于增强性能

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摘要

Photoinduced charge carrier behavior is critical in determining photoelectrocatalytic activity. In this study, a unique layer-doped metal-free polymeric carbon nitride (C3N4) photoanode is fabricated by using one-pot thermal vapor deposition. With this method, a photoanode consisting of a phosphorus-doped top layer, boron-doped middle layer, and pristine C3N4 bottom layer, was formed as a result of the difference in thermal polymerization kinetics associated with the boron-containing H3BO3-melamine complex and the phosphorus-containing H3PO4-dicyandiamide complex. This layer-doping fabrication strategy effectively contributes to the formation of dual junctions that optimizing charge carrier behavior. The ternary-layer C3N4 photoanode exhibits significantly enhanced photoelectrochemical water oxidation activity compared to pristine C3N4, with a record photocurrent density of 150 +/- 10 mu A cm(-2) at 1.23 V vs. RHE. This layer-doping strategy provides an effective means for design and fabrication of photoelectrodes for solar water oxidation.
机译:光抑制电荷载流子行为对于确定光电催化活性至关重要。在该研究中,通过使用单罐热气相沉积来制造独特的层掺杂无金属聚合物碳氮化物(C3N4)光电沸点。通过该方法,由磷掺杂的顶层,掺杂的中间层和原始C3N4底层组成的光电码作为与含硼H3BO3-三聚氰胺复合物相关的热聚合动力学差异而形成。含磷H3PO4-双氰胺复合物。该层掺杂制造策略有效地有助于形成优化电荷载流子行为的双结。与原始C3N4相比,三元层C3N4 PhotoNode表现出显着增强的光电化学水氧化活性,在1.23V与rhe的记录光电流密度为150 +/-10μm(-2)。该层掺杂策略提供了用于光电氧化光电子的设计和制造的有效手段。

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