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首页> 外文期刊>Industrial and organizational psychology >The Effect of ALD-Zn(O,S) Buffer Layer on the Performance of CIGSSe Thin Film Solar Cells
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The Effect of ALD-Zn(O,S) Buffer Layer on the Performance of CIGSSe Thin Film Solar Cells

机译:ALD-ZN(O,S)缓冲层对CIGSSE薄膜太阳能电池性能的影响

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In this paper, we report the development of Cd-free buffers using atomic layer deposition (ALD) for Cu(In,Ga)(S,Se)(2)-based solar cells. The ALD process gives good control of thickness and the S/S+O ratio content of the films. The influence of the growth per cycle (GPC) and the S/(S+O) ratio, and the glass temperature of the atomic layer deposited Zn(O,S) buffer layers on the efficiency of the Cu(In,Ga)(S,Se)(2) solar cells were investigated. We present the first results from our work on cadmium-free CIGS solar cells on substrates with an aperture area of 0.4 cm(2). These Zn(O,S) layers were deposited by atomic layer deposition at 120 degrees C with S/Zn ratios of 0.7, and layers of around 30 nm. The Zn(O,S) 20% (Pulse Ratio: H2S/H2O+H2S) process results in a S/Zn ratio of 0.7. We achieved independently certified aperture area efficiencies of 17.1% for 0.4 cm(2) cells.
机译:在本文中,我们报告了使用原子层沉积(ALD)用于Cu(In,Ga)(Se,Se)(2)的太阳能电池的开发。 ALD过程良好地控制薄膜的厚度和S / S + O比率含量。 每个循环(GPC)和S /(S + O)比的生长的影响以及原子层沉积Zn(o,S)缓冲层的玻璃温度对Cu(In,Ga)的效率( S,SE)(2)进行了太阳能电池。 我们将第一款结果从我们的游离镉上的CIGS太阳能电池上提出了第一款,孔面积为0.4cm(2)。 将这些Zn(O,S)层通过以120℃的原子层沉积沉积,其S / Zn比为0.7,层约为30nm。 Zn(O,S)20%(脉冲比:H2S / H2O + H 2 S)过程导致S / Zn比为0.7。 我们实现了0.4cm(2)个细胞的17.1%的独立认证的孔径面积效率。

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