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首页> 外文期刊>Autonomic neuroscience: basic & clinical >Synthesis and Solution Processing of Nylon-5 Ferroelectric Thin Films: The Renaissance of Odd-Nylons?
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Synthesis and Solution Processing of Nylon-5 Ferroelectric Thin Films: The Renaissance of Odd-Nylons?

机译:尼龙-5铁电薄膜的合成与溶液加工:奇尼龙的文艺量?

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Among odd-nylons, nylon-5 exhibits the highest remanent polarization and is thus a desirable material for many applications of ferroelectric polymers. However, nylon-5 has never been used as a ferroelectric material, because the synthesis of nylon-5 and its processing into thin films are challenging. This work revisits the synthesis of nylon-5 via anionic ring opening polymerization (AROP) and studies the effect of reaction time and scale-up on (i) molecular weight (M-n), (ii) melting point (T-m), (iii) yield, and (iv) ferroelectric properties. For the first time, the molecular weight of nylon-5 is characterized via size exclusion chromatography (SEC), nuclear magnetic resonance (NMR) spectroscopy, as well as matrix assisted laser desorption ionization time of flight mass spectroscopy (MALDI ToF-MS), showing M-n values of up to 12 500 g mol(-1). Extended reaction times and the synthesis on a larger scale increase the molecular weight and yield. Nylon-5 thin films are fabricated from a TFA:acetone (60:40 mol%) solvent mixture. Nylon-5 thin-film capacitors are ferroelectric and show a remanent polarization as high as 12.5 +/- 0.5 mu C cm(-2), which is stable in time. The high remanent polarization values, combined with the facile solution processing, render nylon-5 a promising candidate for future microelectronic and multi-ferroic applications.
机译:在奇数尼龙中,尼龙-5表现出最高的再掺杂极化,因此是一种可用于铁电聚合物的许多应用的理想材料。然而,尼龙-5从未被用作铁电材料,因为尼龙-5的合成及其加工成薄膜是具有挑战性的。该工作通过阴离子环开口聚合(AROP)重新释放尼龙-5的合成,并研究反应时间和缩放对(i)分子量(Mn),(ii)熔点(III)的影响产量和(iv)铁电性能。首次,尼龙-5的分子量通过尺寸排阻色谱(SEC),核磁共振(NMR)光谱,以及飞行质谱(MALDI TOF-MS)的基质辅助激光解吸电离时间(MALDI TOF-MS)。显示高达12 500 g mol(-1)的Mn值。扩展反应时间和较大规模的合成增加了分子量和产率。尼龙-5薄膜由TFA制成:丙酮(60:40mol%)溶剂混合物。尼龙-5薄膜电容器是铁电,并显示出高达12.5 +/- 0.5 mu C cm(-2)的倒置偏振,其及时稳定。高次熔偏振值,结合了容易解决方案处理,使尼龙-5成为未来微电子和多铁应用的有希望的候选者。

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