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Ultrathin and Ultrasmooth Gold Films on Monolayer MoS2

机译:Monolayer MOS2上的超薄和超级金膜

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摘要

Sub-10 nm continuous metal films are promising candidates for flexible and transparent nanophotonics and optoelectronic applications. In this article, it is demonstrated that monolayer MoS2 is a perspective adhesion layer for the deposition of continuous conductive gold films with a thickness of only 3-4 nm. Optical properties of continuous ultrathin gold films deposited on 2D MoS2 grown by chemical vapor deposition are investigated by spectroscopic ellipsometry over a wide wavelength range (300-3300 nm). Results show that optical losses in ultrathin films increase with decreasing thickness due to the fine-grained structure and the presence of a small number of voids, however, they exhibit metallic properties down to a thickness of 3-4 nm. The atomic-scale MoS2 interfaces can be transferred to any substrate and thus open up new opportunities for the creation of metasurfaces and a new type of van der Waals heterostructures with atomically thin metal layers.
机译:Sub-10 NM连续金属膜是柔性透明纳米光电学和光电应用的承诺候选者。 在本文中,证明单层MOS2是用于沉积连续导电金膜的透视粘合层,其厚度仅为3-4nm。 通过光谱椭圆形测量在宽波长范围内(300-3300nm)来研究沉积在2D MOS2上沉积的连续超薄金膜的光学性质。 结果表明,由于细菌结构,超薄膜中的光学损失随着细粒结构的厚度而增加,但是,它们的存在少量空隙,它们将金属性能降至3-4nm的厚度。 原子尺度MOS2接口可以转移到任何基板,从而开辟了创造元核的新机会,以及具有原子薄金属层的新型范德华异质结构。

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