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Electrical resistivity and the Neel point of Mn100-xCrx thin films

机译:MN100-XCRX薄膜电阻率和NEEL点

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Electrical resistivity measurements have beencarried out on thermal evaporated Mn100-xCrx (X=0.5,1,2,) thinfilms between 300 and 1.4K using the van der Pauw four probetechnique. A resemblance of the resistivity-temperature behaviourtypical of the bulk ?-Mn-Rich, specimen is obtained with the 0.5at .%Cr in Mn. The Neel point of this specimen is shifted to 83+-1K from the known value of 90+- 1K for ?-Nn. The Neel point isshifted further to lower values as the concentration of Cr in Mnincreases. The low temperature resistivity minimum may beinterpreted as due to the presence of Cr impurities in the Mn filmgiving rise to a distortion of the magnetic moment of themanganese atoms and thus leading to spin fluctuation scattering ofthe conduction electrons. 2000 Elsevier Science Ltd. All rights reserved.
机译:使用VAN der Pauw Four ProbeTechnique,电阻率测量在热蒸发的MN100-XCRX(x = 0.5,1,2,)薄晶片之间进行了薄型蒸发的MN100-XCRX(x = 0.5,1,2,)。 用0.5At,在Mn中的0.5At%Cr,获得富含批量的电阻率 - 温度行为的相似性。 该样本的NEEL点从已知值为90 + - 1K的83 + -1k转移到83 + -1K。 NEEL点进一步升级以降低值作为MNIncrease中Cr的浓度。 低温电阻率最小可能是由于Mn薄膜上的Cr杂质的存在而被呈现为蒙古洲原子的磁矩的变形,从而导致传导电子的旋转波动散射。 2000年elestvier科学有限公司保留所有权利。

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