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Effect of Ti_3SiC_2 doping on critical current density and flux pinning in MgB_2

机译:Ti_3SiC_2掺杂对MgB_2临界电流密度和磁通钉扎的影响

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摘要

Ti_3SiC_2 is used as the dopant, which not only provides C source for C substitution for B in the MgB_2 lattice, but also produces more non-superconducting precipitates locating in MgB_2 grain boundaries acting as the pinning centers. Carbon substitution of boron can be confirmed by the (100) peak of MgB_2 shift behavior with increasing Ti_3SiC_2 doping level. The critical current density (Jc) values are determined by M-H hysteresis loops. In low magnetic fields, the J_c values for the undoped sample are higher than that for the doped samples. However, with increasing magnetic fields, the J_c values for the doped samples are found to be enhanced for MgB_(1.9)(Ti_3SiC_2)_(0.05) and MgB_(1.85)(Ti_3SiC_2)_(0.075). The flux pinning behavior has been investigated and it reveals that the flux pinning force can be improved by Ti_3SiC_2 doping, when the non-superconducting phases uniformly distribute in MgB_2 matrix and they do not depress the intergrain connectivity.
机译:Ti_3SiC_2用作掺杂剂,不仅为MgB_2晶格中的B的C替代提供了C源,而且还产生了更多的非超导析出物,位于MgB_2晶界中作为钉扎中心。硼的碳取代可以通过随着Ti_3SiC_2掺杂水平的提高而发生的MgB_2转变行为的(100)峰来确认。临界电流密度(Jc)值由M-H磁滞回线确定。在低磁场中,未掺杂样品的J_c值高于掺杂样品的J_c值。然而,随着磁场的增加,发现对于MgB_(1.9)(Ti_3SiC_2)_(0.05)和MgB_(1.85)(Ti_3SiC_2)_(0.075),掺杂样品的J_c值得到增强。研究了磁通钉扎行为,发现当非超导相均匀分布在MgB_2基体中且不压低晶粒间的连通性时,通过Ti_3SiC_2掺杂可以改善磁通钉扎力。

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