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Possible indirect to direct bandgap transition in SnS2 via nickel doping

机译:可能间接通过镍掺杂直接在SNS2中直接带隙过渡

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摘要

Direct bandgap semiconductors play a critical role in optoelectronics. In this regard, SnS2 is a two-dimensional (2D) layered semiconductor which has ignited intensive attention due to its semiconducting nature and nontoxicity. The pristine SnS2, however, has an indirect bandgap. For a more widespread use, it is highly desired to translate SnS2 into direct bandgap semiconductors by controlling external parameters. Utilizing first-principles calculation methods with HSE hybrid functional, we show the possibility of indirect to direct bandgap transition in SnS2 single layer via nickel (Ni) doping. A substitutional Ni-dopant on the tin site of SnS2 generates new band lines at the bottom of the conduction band due to strong orbital hybridization with states of its nearby sulfur atoms. Consequently, the direct bandgap can be achieved in SnS2; moreover, the bandgap size is narrowed as the number of Ni-dopants increases.
机译:直接带隙半导体在光电子中发挥着关键作用。 在这方面,SNS2是二维(2D)分层半导体,由于其半导体性质和无毒性,它被引入强化。 然而,原始SNS2具有间接带隙。 为了更广泛的使用,非常希望通过控制外部参数将SNS2转换为直接带隙半导体。 利用具有HSE混合功能的第一原理计算方法,我们展示了间接通过镍(Ni)掺杂在SNS2单层中引导带隙过渡的可能性。 SNS2的锡部位上的替代Ni掺杂剂在导通带的底部产生新的带线,由于与其附近的硫原子的状态强烈杂交。 因此,直接带隙可以在SNS2中实现; 此外,随着Ni掺杂剂的数量增加,带隙尺寸变窄。

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