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首页> 外文期刊>Bulletin of the Polish Academy of Sciences. Technical Sciences >Demonstration of HOT photoresponse of MWIR T2SLs InAs/InAsSb photoresistors
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Demonstration of HOT photoresponse of MWIR T2SLs InAs/InAsSb photoresistors

机译:MWIR T2SLS INAS / INASSB光致抗蚀剂的热光响应的演示

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We report on the photoresponse of mid-wavelength infrared radiation(MWIR) type-II superlattices(T2SLs) InAs/InAsSb high operating temperature(HOT) photoresistor grown on GaAs substrate.The device consists of a 200 periods of active layer grown on GaSb buffer layer.The photoresistor reached a 50% cut-off wavelength of 5 μm and 6 μm at 200 K and 300 K respectively.The time constant of 30 ns is observed at 200 K under 1 V bias.This is the first observation of the photoresponse in MWIR T2SLs InAs/InAsSb above 200 K..
机译:我们报告了在GaAs基底上生长的中波长红外辐射(MWIR)II型超晶格(T2SL)II型超晶格(T2SL)的光反对子(MWIR)INAS / INASB高工作温度(热)光致抗蚀剂。该装置包括在GASB缓冲液上生长的200周期的有源层 光致抗蚀剂分别达到5μm和6μm的50%截止波长,分别为200 k和300 k。在1 v偏见下观察到30ns的时间常数。这是光响应的第一次观察 在MWIR T2SLS INAS / INASSB以上200 k ..

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