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Resistance-switching properties of Bi-doped SrTiO3 films for non-volatile memory applications with different device structures

机译:双掺杂SRTIO3薄膜对不同装置结构的非易失性存储器应用的电阻切换性能

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摘要

SrTiO3 and Bi-doped SrTiO3 films were fabricated with different device structures using the sol-gel method for non-volatile memory applications, and their resistance-switching behaviour, endurance and retention characteristics were investigated. SrTiO3 and Sr0.92Bi0.08TiO3 films grown on Si or Pt have the same phase structure, morphologies and grain size; however, the grain size of the Sr0.92Bi0.08TiO3 films grown on Si is slightly larger than those of the SrTiO3 films grown on Si and the Sr0.92Bi0.08TiO3 films grown on Pt. The SrTiO3 or Sr0.92Bi0.08TiO3 films grown on Si or Pt all exhibit bipolar resistive-switching behaviour and follow the same conductive mechanism; however, the Ag/ Sr0.92Bi0.08TiO3/ Si device possesses the highest RHRS/ RLRS of 105 and the best endurance and retention characteristics. The doping of Bi is conducive to enhance the RHRS/ RLRS of the SrTiO3 films; meanwhile, the Si substrates help improve the endurance and retention characteristics of the Sr0.92Bi0.08TiO(3) films.
机译:使用用于非易失性存储器应用的溶胶 - 凝胶法,用不同的装置结构制造SRTIO3和双掺杂的SRTIO3薄膜,并研究了它们的电阻切换行为,耐久性和保持特性。 Sri3和Sr0.92bi0.08tio3在si或pt上生长的薄膜具有相同的相结构,形态和粒度;然而,在Si上生长的Sr0.92bi0.08tio3薄膜的晶粒尺寸略大于在Si上生长的SRTIO3薄膜和在Pt上生长的SR0.92bi0.08tio3薄膜。 Sri 3或Sr0.92bi0.08tio3薄膜在Si或Pt上生长,所有表现出双极电阻切换行为,并遵循相同的导电机构;但是,AG / SR0.92BI0.08TIO3 / SI器件具有105的最高RHRS / RLR,最佳耐久性和保留特性。 BI的掺杂有利于增强SRTIO3薄膜的RHRS / RLS;同时,Si底物有助于改善SR0.92bi0.08tio(3)膜的耐久性和保留特性。

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