Preparation of metal oxide thin films from organic-additive-free aqueous solutions by low-speed dip-coating

摘要

Here we propose a novel coating technique with low-speed dip-coating for preparing metal oxide thin films from organic-additive-free aqueous solutions, where the film formation on the substrate is achieved via an evaporation-driven deposition during dip-coating of extremely low substrate withdrawal speeds below 1.0 cm min(-1) in a thermostatic oven at 25-60 degrees C. Transparent, crack-free SnO2 and TiO2 precursor films were obtained from SnCl4 and TiOSO4 aqueous solutions, respectively, by low-speed dip-coating. The precursor films thus obtained were crystallized to SnO2 and TiO2 films by the heat treatment at 700 degrees C for 10 min in air.