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Influence of interface properties on charge density, band edge shifts and kinetics of the photoelectrochemical process in p-type NiO photocathodes

机译:p型Nio光电阴极界面性能对光电化学过程的电荷密度,带边的影响和动力学的影响

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摘要

Nickel oxide as one of the few p-type semiconductors has great potential applications in the construction of photovoltaics and solar fuel production devices. The present work focuses on understanding the surface structure of NiO by controlling the surface Ni3+ species (e.g. NiO(OH)) that influence the electrochemical process at the NiO/liquid electrolyte interface. With the aid of the Mott-Schottky method, electrochemical impedance spectroscopy and photocurrent-voltage correlation testing, various NiO surface structures were correlated with observed changes in the band energies, energetic distributions of the trap states densities, charge interface transfer, charge transport, and as a result the p-type DSSC device performances. The primary results demonstrate that the NiO(OH) species act as recombination centers and cause worse interface recombination. Furthermore, we also report an effective way of reducing the surface NiO(OH) structures by a Ni(CH3COOH)(2) post-treatment method, resulting in a 31.3% increase in the photovoltaic performance. Our work provides good guidance for the design and fabrication of solar energy-related devices employing NiO electrodes.
机译:氧化镍作为少数p型半导体之一具有巨大的潜在应用,在光伏和太阳能燃料生产装置的构造中具有巨大的应用。本工作侧重于通过控制影响NiO /液体电解质界面处的电化学过程的表面Ni3 +物种来理解NIO的表面结构。借助Mott-Schottky方法,电化学阻抗谱和光电流 - 电压相关测试,各种NIO表面结构与观察到的频带能量的变化相关,陷阱状态密度的能量分布,充电接口传输,电荷运输和结果,P型DSSC设备的性能。主要结果表明,NIO(OH)物种充当重组中心并导致更差的界面重组。此外,我们还报告了通过Ni(CH 3 COOH)(2)后处理方法减少表面NIO(OH)结构的有效方法,导致光伏性能增加31.3%。我们的工作为采用NIO电极的太阳能相关装置的设计和制造提供了良好的指导。

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  • 来源
    《RSC Advances》 |2015年第88期|共7页
  • 作者单位

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Shanghai Univ Res Ctr Nanosci &

    Nanotechnol Shanghai 200444 Peoples R China;

    Chinese Acad Sci Shanghai Adv Res Inst Div Energy &

    Environm Res Shanghai 201203 Peoples R China;

    Shanghai Univ Sch Mat Shanghai 200444 Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学;
  • 关键词

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