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Efficient visible light photocatalysis and tunable photoluminescence from orientation controlled mesoporous Si nanowires

机译:取向控制介孔Si纳米线的高效可见光光催化和可调谐光致发光

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Herein, orientation controlled growth of single crystalline mesoporous Si nanowires (NWs) by Ag assisted etching of Si(100) and Si(111) wafers and its visible light photocatalysis efficiencies have been studied. By choosing different orientations of the starting Si wafer and concentration of etchants, we have tuned the morphology of Si NWs and achieved straight, bent, kinked and zigzag Si NWs. High resolution FESEM and TEM imaging reveals that the Si NWs are decorated with ultra-small Si nanocrystals (NCs) of arbitrary shape due to the lateral etching of the NWs. A strong broad-band visible to near-infrared (NIR) photoluminescence (PL) in the range 1.4-2.4 eV is observed from these Si NWs/NCs at room temperature. Our studies reveal that the quantum confinement of carriers in Si NCs and the nonbridging oxygen hole center (NBOHC) defects in the SiOx layer both contribute to the broad visible-NIR PL. In addition to the efficient PL emission, the metal assisted chemical etching (MACE) grown Si NWs exhibit excellent photocatalytic degradation of methylene blue under visible light illumination. The Si-H bonds present on the surface of the Si NWs/NCs facilitate the photocatalytic activity by efficient separation of the photogenerated e-h pairs. Our studies reveal that the MACE grown vertically aligned Si NWs behave as a stable photocatalyst for up to five cycles of catalysis. It is found that with the increase in the concentration of HF during etching, PL intensity systematically decreases while the photocatalytic efficiency increases with the HF concentration due to the Si-H bonds. Our results open up the possibility of using Si NWs arrays in white light display applications as well as organic waste treatment and hydrogen production by photocatalytic water splitting.
机译:这里,已经研究了通过Ag辅助蚀刻Si(100)和Si(111)晶片和其可见光光催化效率的单晶介孔Si纳米线(NWS)的取向控制生长。通过选择起始Si晶片和蚀刻剂浓度的不同取向,我们调整了Si NWS的形态,并实现了直,弯曲,扭结和Zigzag Si NWS。高分辨率FeSEM和TEM成像显示,由于NWS的横向蚀刻,Si NWS由Quall-Small Si纳米晶体(NCS)装饰。在室温下从这些SiNWS / NCS观察到近红外(nIR)光致发光(PL)可见的强宽带。我们的研究表明,Si NCS中载体的量子诱惑和SiN氧孔中心(NBOHC)缺陷在SiOx层中缺陷既有助于宽的可见NIR PL。除了有效的PL发射之外,金属辅助化学蚀刻(坐标)生长的Si NWS在可见光照射下表现出优异的光催化降解亚甲基蓝色。存在于SiNWS / NCS的表面上的Si-H键通过有效分离光发性的E-H对,促进光催化活性。我们的研究表明,垂直对齐的Si NWS的术术表现为最多五个催化的稳定光催化剂。结果发现,随着蚀刻期间HF浓度的增加,PL强度系统地降低,而光催化效率随着Si-H键而增加。我们的结果开辟了白光显示器应用中使用Si NWS阵列的可能性以及通过光催化水分裂的有机废物处理和氢生产。

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  • 来源
    《RSC Advances 》 |2016年第42期| 共13页
  • 作者

    Ghosh Ramesh; Giri P. K.;

  • 作者单位

    Indian Inst Technol Guwahati Dept Phys Gauhati 781039 India;

    Indian Inst Technol Guwahati Dept Phys Gauhati 781039 India;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学 ;
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