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Photoinduced doping and photoluminescence signature in an exfoliated WS2 monolayer semiconductor

机译:exfoliated WS2单层半导体中的光诱导掺杂和光致发光签名

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摘要

Following graphene, atomically thin two-dimensional transition metal dichalcogenides (2D-TMDs) are quickly emerging as a new multidisciplinary frontier across condensed matter physics, materials science and inorganic chemistry. Compared with graphene, the optical and optoelectronic properties of 2D-TMD materials are more attractive largely due to the nature of their direct band gap. In this article, we show an interesting demonstration of the photoinduced doping effect in a mechanically-exfoliated high-quality tungsten disulfide (WS2) monolayer semiconductor. By utilizing a focused laser beam and increasing its intensity, we successfully observed a photoinduced doping effect, indicated by the gradual tuning of dominant light emission from a single narrow emission band peaking at 2.017 eV (Peak 1) to a broad asymmetric emission band (Peak 2) eventually located at around 1.955 eV at room temperature. Moreover, the peak position of Peak 2 shows a distinct red shift dependence on the excitation intensity, predicted by the band gap renormalization theory due to the heavy doping. Justified from their spectral features and excitation intensity dependence, the narrow emission band is ascribed to the fundamental band edge free exciton transition, whereas the broad asymmetric one is ascribed to the localized state ensemble induced by photo doping.
机译:在石墨烯之后,原子上薄的二维过渡金属二甲基(2D-TMDS)在凝结物理学,材料科学和无机化学的新多学科前沿迅速涌现。与石墨烯相比,2D-TMD材料的光学和光电子性能在很大程度上具有更大的吸引力,这是由于其直接带隙的性质。在本文中,我们展示了在机械剥离的高质量钨二硫化物(WS2)单层半导体中的光诱导掺杂效果的有趣证明。通过利用聚焦激光束并增加其强度,我们成功地观察了光致掺杂效果,通过从2.017eV(峰值1)的单个窄发射带峰值从2.017eV(峰值1)达到宽的不对称发射带(峰值2)最终位于室温约为1.955eV。此外,峰值2的峰值位置示出了由于厚度掺杂引起的带隙重整理论预测的激励强度的不同的红色移位依赖性。从它们的光谱特征和激发强度依赖性依赖,窄发射带归因于基波频带边缘自由激子转变,而宽的不对称符合照片掺杂诱导的局部状态集合。

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  • 来源
    《RSC Advances 》 |2016年第33期| 共5页
  • 作者单位

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

    Univ Hong Kong Dept Phys Pokfulam Rd Hong Kong Hong Kong Peoples R China;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 化学 ;
  • 关键词

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