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首页> 外文期刊>Journal of Physics. Condensed Matter >Trivial band topology of ultra-thin rhombohedral Sb2Se3 grown on Bi2Se3
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Trivial band topology of ultra-thin rhombohedral Sb2Se3 grown on Bi2Se3

机译:在Bi2se3上生长的超薄菱形SB2Se3的琐碎带拓扑

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摘要

Thin films of rhombohedral Sb2Se3 with thicknesses from 1 to 5 quintuple layers (QL) were grown on Bi2Se3/Si(1 1 1) substrate. The electronic band structure of the grown films and the Sb2Se3/Bi2Se3 interface were studied using angle-resolved photoemission spectroscopy. It was found that while Sb2Se3 has an electronic band structure generally similar to that of Bi2Se3, there is no fingerprints of band inversion in it. Instead, the one-QL-thick Sb2Se3 films show direct band gap of about 80 meV. With growing film thickness, the Fermi level of the Sb2Se3 films gradually shifts by 200 meV for 5 QL-thick film revealing the band bending of the Sb2Se3/Bi2Se3 hetero-junction.
机译:在Bi2Se3 / Si(111)基板上生长具有1至5个Quintuple(Q1)的厚度的rhombohedral sb2se3的薄膜。 使用角度分辨的光曝光光谱研究生长薄膜和Sb2Se3 / Bi2Se3界面的电子带结构。 发现,虽然SB2Se3具有通常与Bi2Se3的电子频带结构与Bi2Se3的电子频带结构相似,但是在其中没有带反转的指纹。 相反,单QL厚的SB2Se3薄膜显示约80 meV的直接带隙。 随着薄膜厚度的增长,Sb2Se3膜的费米水平逐渐移位200meV,对于5 QL厚膜,揭示SB2Se3 / Bi2Se3杂连接的带弯曲。

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