首页> 外文期刊>Journal of Physics. Condensed Matter >Oxygen vacancies and hydrogen doping in LaAlO3/SrTiO3 heterostructures: electronic properties and impact on surface and interface reconstruction
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Oxygen vacancies and hydrogen doping in LaAlO3/SrTiO3 heterostructures: electronic properties and impact on surface and interface reconstruction

机译:Laal3 / Srtio3异质结构的氧气空位和氢气掺杂:电子性质和对表面和界面重建的影响

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We investigate the effect of oxygen vacancies and hydrogen dopants at the surface and inside slabs of LaAlO3, SrTiO3, and LaAlO3/SrTiO3 heterostructures on the electronic properties by means of electronic structure calculations as based on density functional theory. Depending on the concentration, the presence of these defects in a LaAlO3 slab can suppress the surface conductivity. In contrast, in insulating SrTiO3 slabs already very small concentrations of oxygen vacancies or hydrogen dopant atoms induce a finite occupation of the conduction band. Surface defects in insulating LaAlO3/SrTiO3 heterostructure slabs with three LaAlO3 overlayers lead to the emergence of interface conductivity. Calculated defect formation energies reveal strong preference of hydrogen dopant atoms for surface sites for all structures and concentrations considered. Strong decrease of the defect formation energy of hydrogen adatoms with increasing thickness of the LaAlO3 overlayer and crossover from positive to negative values, taken together with the metallic conductivity induced by hydrogen adatoms, seamlessly explains the semiconductor-metal transition observed for these heterostructures as a function of the overlayer thickness. Moreover, we show that the potential drop and concomitant shift of (layer resolved) band edges is suppressed for the metallic configuration. Finally, magnetism with stable local moments, which form atomically thin magnetic layers at the interface, is generated by oxygen vacancies either at the surface or the interface, or by hydrogen atoms buried at the interface. In particular, oxygen vacancies in the TiO2 interface layer cause drastic downshift of the 3d e(g) states of the Ti atoms neighboring the vacancies, giving rise to strongly localized magnetic moments, which add to the two-dimensional background magnetization.
机译:我们通过基于密度泛函理论,通过电子结构计算研究了氧空位和氢掺杂剂在Laalo3,Srtio3和Laalo3 / Srtio3异质结构上的效果和氢掺杂剂在电子特性上的影响。取决于浓度,Laalo3板坯中这些缺陷的存在可以抑制表面电导率。相反,在绝缘的SRTIO3板坯中已经非常小的氧空位或氢掺杂剂原子诱导导带的有限占据。具有三个Laal3 / SRTIO3的表面缺陷,具有三个LAALO3叠层的异质结构,导致界面电导率的出现。计算的缺陷形成能量揭示了所考虑所有结构和浓度的表面位点的氢掺杂剂原子的强烈偏好。氢adatoms的缺陷形成能量随着Laalo3覆盖物的厚度和从正到负值的横向于氢染色剂诱导的金属传导率而产生的强烈降低,无缝解释了这些异质结构的半导体 - 金属转变作为函数重叠厚度。此外,我们表明(层分离的)带边的潜在下降和伴随的偏移被抑制了金属配置。最后,通过在表面或界面处的氧空位或通过掩埋界面掩埋的氢原子产生稳定的局部矩片的磁性,其形成稳定的局部矩,其形成界面处的原子薄磁性层。特别地,TiO2接口层中的氧空位导致邻近空位的Ti原子的3D E(g)状态的急剧下降,从而产生强烈的局部磁矩,这增加了二维背景磁化。

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