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首页> 外文期刊>Journal of Physics, D. Applied Physics: A Europhysics Journal >Band alignments at strained Ge1-xSnx/relaxed Ge1-ySny heterointerfaces
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Band alignments at strained Ge1-xSnx/relaxed Ge1-ySny heterointerfaces

机译:紧张Ge1-xsnx /弛豫Ge1-ysny异灶面的带对齐

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Type-I, type-II, reverse type-I, and reverse type-II band alignments are found theoretically in strained Ge1-xSnx (0 <= x <= 0.3) grown on relaxed Ge1-ySny substrates (0 <= y <= 0.3) using the model-solid theory. The prerequisite bandgaps, and energy difference between the top valence band edge and the average valence band position of GeSn are obtained by the nonlocal empirical pseudopotential method. For the indirect-gap (L valleys) Ge1-xSnx on relaxed Ge1-ySny, the band alignments are type-I and reverse type-I under biaxial compressive strain (x > y) and biaxial tensile strain (x < y), respectively. For the direct-gap (Gamma valley) Ge1-xSnx on relaxed Ge1-ySny, the biaxial compressive strain yields type-I and type-II alignment, while the biaxial tensile strain yields reverse type-I and reverse type-II alignments.
机译:Type-i,II型,反向类型I和反向类型-I频带对齐在放松的GE1-YSNY基板上生长的应变GE1-XSNX(0 <= x <= 0.3)中发现(0 <= Y < = 0.3)使用模型固体理论。 通过非识别经验伪能量方法获得先决条件的带隙,顶部价带边缘和GESN的平均价频带位置之间的能量差。 对于轻松的GE1-ysny上的间接间隙(L VALLEYS)GE1-XSNX,带对准是型-i和双轴压缩菌株(X> Y)和双轴拉伸菌株(X

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