机译:由于低能量高通量氢等离子体暴露,通过钨利用诱导辐照硬化
Tsinghua Univ Sch Mat Sci &
Engn Beijing 100084 Peoples R China;
Cent S Univ Sch Civil Engn Dept Mech Changsha 410075 Hunan Peoples R China;
Univ Birmingham Sch Met &
Mat Birmingham B15 2TT W Midlands England;
Univ Birmingham Sch Met &
Mat Birmingham B15 2TT W Midlands England;
Nucl Power Inst China Sci &
Technol Reactor Fuel &
Mat Lab Chengdu 610213 Sichuan Peoples R China;
Tsinghua Univ Sch Mat Sci &
Engn Beijing 100084 Peoples R China;
DIFFER Dutch Inst Fundamental Energy Res Zaale 20 NL-5612 AJ Eindhoven Netherlands;
Tsinghua Univ Sch Mat Sci &
Engn Beijing 100084 Peoples R China;
Univ Birmingham Sch Met &
Mat Birmingham B15 2TT W Midlands England;
Blistering; Irradiation hardening; TEM; Nano-indentation; Theoretical model;
机译:由于低能量高通量氢等离子体暴露,通过钨利用诱导辐照硬化
机译:高通量和低能氘等离子体暴露的钨起泡和氘保留的温度依赖性
机译:起泡对高通量氘10-100 eV等离子体辐照钨中氘保留的影响
机译:高通氘10-100 eV等离子体照射钨氘保留的影响
机译:晶体取向对面向等离子体的钨表面中注入低能氢,氦和氢/氦混合物的影响。
机译:低能高通量氦气辐照下钨的纳米结构绒毛生长
机译:暴露于高通量等离子体的辐照钨中的氢保留