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Low-cost, fast and easy production of germanium nanostructures and interfacial electron transfer dynamics of BODIPY-germanium nanostructure system

机译:锗纳米结构的低成本,快速,快速地生产Bodipy-锗纳米结构系统的界面电子传递动力学

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摘要

Germanium nanostructures are prepared by electrochemical etching of n-type Sb-doped (100) oriented germanium (Ge) substrates with resistivity of 0.01 Omega cm. Ge substrates are etched in an electrochemical double cell containing hydrofluoric acid and ethanol solution at room temperature. Although the use of illumination source is essential for etching of an n-type semiconductor material, the influence of illumination source type on the germanium surface morphology has not yet been investigated. In this work, the illumination effect is studied by halogen lamp, white LED, 470- and 405-nm pulsed diode laser. It is demonstrated that different Ge surface morphologies such as nanocone, nanorod, nanoplate and nanopyramid are obtained using different illumination source. The current density, anodization time and pulsed laser power density effects on Ge nanopyramid are investigated in order to optimize anodization conditions. The most uniform and continuous Ge nanopyramid array is obtained at the current density of 30 mA/cm(2) for 45 min under cathode side illumination with 470-nm pulsed diode laser. It is observed that the nanostructured Ge surfaces exhibit a broad photoluminescence band between 400 and 650 nm. Time-resolved fluorescence spectroscopy studies of electron transfer process between BODIPY dye and Ge nanostructures are reported. The obtained fluorescence lifetime data are analyzed in the light of the Marcus electron transfer theory to determine the conduction band energy level of nanostructured germanium substrates.
机译:锗纳米结构通过用0.01厘米欧米茄电阻率的n型掺杂Sb的(100)取向的锗(Ge)基板的电化学蚀刻制备。在室温下在含有氢氟酸和乙醇溶液的电化学双电池中蚀刻Ge底物。尽管使用照明源对N型半导体材料的蚀刻是必不可少的,但是尚未研究照明源类型对锗表面形态的影响。在这项工作中,通过卤素灯,白色LED,470-和405nm脉冲二极管激光研究了照明效果。证明使用不同的照明源获得诸如纳米核酮,纳米棒,纳米层和纳米滤网等不同的GE表面形态。研究了电气纳米吡喃胺的电流密度,阳极氧化时间和脉冲激光功率密度效应,以优化阳极氧化条件。在具有470-nm脉冲二极管激光器的阴极侧照明下,在30mA / cm(2)的电流密度下获得最均匀和连续的Ge纳米滤网阵列。观察到纳米结构Ge表面在400至650nm之间表现出宽的光致发光带。据报道,据报道了Bodipy染料与Ge纳米结构之间的电子转移过程的时间分辨荧光光谱研究。根据Marcus电子转移理论分析所获得的荧光寿命数据以确定纳米结构锗基材的导带能水平。

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  • 来源
    《Journal of Materials Science》 |2017年第22期|共14页
  • 作者单位

    Karamanoglu Mehmetbey Univ Dept Met &

    Mat Engn TR-70100 Karaman Turkey;

    Karamanoglu Mehmetbey Univ Dept Met &

    Mat Engn TR-70100 Karaman Turkey;

    Karamanoglu Mehmetbey Univ Dept Met &

    Mat Engn TR-70100 Karaman Turkey;

    Karamanoglu Mehmetbey Univ Dept Met &

    Mat Engn TR-70100 Karaman Turkey;

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  • 原文格式 PDF
  • 正文语种 eng
  • 中图分类 工程材料学;
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