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Contact reactive brazing of Al7075 alloy using Cu layer deposited by magnetron sputtering

机译:通过磁控溅射沉积的Cu层接触Al7075合金的无功钎焊

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Plasma bombardment was applied to remove the surface oxide film of 7075 alloy and the deposited Cu layer with thickness of similar to 20 mu m was attached closely to the surface of 7075 alloy by magnetron sputtering process. The brazing of 7075 alloy using Cu foil was carried out at 580 degrees C as the contrast test. The results showed that the brazed joints using deposited Cu layer have better microstructure and higher mechanical properties than that of using Cu foil. As brazing temperature increased to 570 degrees C, the deposited Cu layer was dissolved into the substrate gradually and formed intermetallic compounds. Further increasing brazing temperature, the intermetallic compounds were reduced and the homogenization of microstructure of brazed joints was enhanced. The shear strength of brazed joints increased firstly and then decreased with the increasing of brazing temperature. The maximum shear strength of 38.7 MPa was obtained when brazing temperature was 600 degrees C.
机译:施加等离子体轰击以除去7075合金的表面氧化物膜,并且厚度与20μm的沉积Cu层通过磁控溅射工艺紧密地连接到7075合金的表面。 用Cu箔钎焊在580℃下进行7075合金作为对比度测试。 结果表明,使用沉积Cu层的钎焊接头具有比使用Cu箔更好的微观结构和更高的机械性能。 由于钎焊温度升至570℃,沉积的Cu层逐渐溶解在基材中并形成金属间化合物。 进一步增加钎焊温度,减少了金属间化合物,增强了钎焊接头的微观结构均化。 钎焊接头的剪切强度首先增加,然后随着钎焊温度的增加而降低。 当钎焊温度为600℃时获得38.7MPa的最大剪切强度。

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