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首页> 外文期刊>Journal of Materials Processing Technology >The effect of process vibrations under different rotational rates on the non-uniform material removal during continuous polishing
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The effect of process vibrations under different rotational rates on the non-uniform material removal during continuous polishing

机译:在连续抛光过程中不同旋转速率下的工艺振动对不均匀材料去除的影响

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摘要

This research illustrates the effect of process vibrations under different rotational rates on the non-uniform material removal, which is characterized by the MRR/v and removed material distribution (RMD) during the continuous polishing. To quantitively calculate the removed material thickness of points on the workpiece, a novel RMD model considering the kinematic parameters, dynamic pressure and the process vibrations is proposed. Several polishing experiments are conducted under different rotational rates. The process vibrations are enhanced by higher rotational rate, resulting in higher MRR/v and fluctuations in the profile of measured RMD. Furthermore, the percentage of error in radial removed thickness (ERRT) to the average removed thickness on the whole workpiece surface is defined to evaluate the accuracy of the RMD model.
机译:该研究说明了在不同旋转速率下对不均匀材料去除的过程振动的影响,其特征在于MRR / V和在连续抛光过程中除去材料分布(RMD)。 为了定量地计算工件上的点的消除材料厚度,提出了考虑运动学参数,动态压力和工艺振动的新型RMD模型。 在不同的旋转速率下进行几个抛光实验。 通过较高的转速增强了过程振动,从而提高了测量RMD的概况的MRR / V和波动。 此外,定义了整个工件表面上的平均除去厚度的径向移除厚度(ERRT)的误差百分比以评估RMD模型的准确性。

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